Mechanism of chemical vapor deposition by laser induced plasma.
نویسندگان
چکیده
منابع مشابه
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ژورنال
عنوان ژورنال: The Review of Laser Engineering
سال: 1990
ISSN: 0387-0200,1349-6603
DOI: 10.2184/lsj.18.9_761